Invention Publication
- Patent Title: BLANK MASK AND PHOTOMASK USING THE SAME
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Application No.: US18340334Application Date: 2023-06-23
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Publication No.: US20230418150A1Publication Date: 2023-12-28
- Inventor: GeonGon LEE , Hyung-joo LEE , Suhyeon KIM , Sung Hoon SON , Seong Yoon KIM , Min Gyo JEONG , Taewan KIM , Inkyun SHIN , Tae Young KIM
- Applicant: SK enpulse Co., Ltd.
- Applicant Address: KR Pyeongtaek-si
- Assignee: SK enpulse Co., Ltd.
- Current Assignee: SK enpulse Co., Ltd.
- Current Assignee Address: KR Pyeongtaek-si
- Priority: KR 20220076792 2022.06.23
- Main IPC: G03F1/32
- IPC: G03F1/32

Abstract:
A blank mask includes a light transmissive substrate, and a light-blocking layer, disposed on the light transmissive substrate, comprising a transition metal and either one or both of oxygen and nitrogen. An average value of grain sizes of a surface of the light-blocking layer ranges from 14 nm to 24 nm.
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