Invention Publication
- Patent Title: DISPLAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND DISPLAY APPARATUS
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Application No.: US17789543Application Date: 2021-07-30
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Publication No.: US20230345793A1Publication Date: 2023-10-26
- Inventor: Yong HU , Zerui ZHANG , Dali LI , Xin LUO
- Applicant: MIANYANG BOE OPTOELECTRONICS TECHNOLOGY CO.,LTD. , BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Mianyang, Sichua
- Assignee: MIANYANG BOE OPTOELECTRONICS TECHNOLOGY CO.,LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: MIANYANG BOE OPTOELECTRONICS TECHNOLOGY CO.,LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Mianyang, Sichua
- Priority: CN 2110121161.6 2021.01.28
- International Application: PCT/CN2021/109730 2021.07.30
- Date entered country: 2022-06-28
- Main IPC: H10K59/40
- IPC: H10K59/40 ; H10K59/122 ; H10K59/80 ; H10K59/131 ; H10K59/12 ; H10K71/00 ; G06F3/044 ; G06F3/041

Abstract:
A display substrate has a display region and a peripheral region. The display substrate includes a substrate, a first dam, a second dam and a connection portion. The first dam and the second dam are located on a side of the substrate, and are located in the peripheral region. The second dam is farther from the display region than the first dam. A height of the second dam is greater than a height of the first dam. The connection portion is located between the first dam and the second dam. The connection portion connects the first dam and the second dam, and a height of the connection portion is less than the height of the first dam. At least a portion of the first dam, at least a portion of the connection portion and at least a portion of the second dam are of an integrative structure.
Public/Granted literature
- US11930665B2 Display substrate and manufacturing method thereof, and display apparatus Public/Granted day:2024-03-12
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