SUBSTRATE TREATING APPARATUS, SUBSTRATE TREATING SYSTEM, AND SUBSTRATE TREATING METHOD
摘要:
Disclosed is a substrate treating apparatus for performing a predetermined treatment on a substrate. The apparatus includes: a recipe memory unit configured to store a recipe; an imaging unit provided at a predetermined location and configured to image the component as a real image at work; a normal image memory unit configured to simulate a condition in advance where the component normally operates in response to the recipe and store in advance a normal image at this time in a view from the location in accordance with three-dimensional design information of the substrate treating apparatus; an operation controller configured to cause the predetermined treatment to be performed; and an abnormality detecting unit configured to detect an abnormality in accordance with a difference between the normal image synchronized with operation of the recipe and the real image.
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