- 专利标题: SUBSTRATE TREATING APPARATUS, SUBSTRATE TREATING SYSTEM, AND SUBSTRATE TREATING METHOD
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申请号: US18171135申请日: 2023-02-17
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公开(公告)号: US20230267603A1公开(公告)日: 2023-08-24
- 发明人: Shinji SHIMIZU
- 申请人: SCREEN Holdings Co., Ltd.
- 申请人地址: JP Kyoto
- 专利权人: SCREEN Holdings Co., Ltd.
- 当前专利权人: SCREEN Holdings Co., Ltd.
- 当前专利权人地址: JP Kyoto
- 优先权: JP 22025799 2022.02.22
- 主分类号: G06T7/00
- IPC分类号: G06T7/00 ; B05B12/12 ; B05D1/00 ; B08B3/04
摘要:
Disclosed is a substrate treating apparatus for performing a predetermined treatment on a substrate. The apparatus includes: a recipe memory unit configured to store a recipe; an imaging unit provided at a predetermined location and configured to image the component as a real image at work; a normal image memory unit configured to simulate a condition in advance where the component normally operates in response to the recipe and store in advance a normal image at this time in a view from the location in accordance with three-dimensional design information of the substrate treating apparatus; an operation controller configured to cause the predetermined treatment to be performed; and an abnormality detecting unit configured to detect an abnormality in accordance with a difference between the normal image synchronized with operation of the recipe and the real image.
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