Invention Publication
- Patent Title: METHOD FOR BIREFRINGENCE PATTERNING
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Application No.: US17948233Application Date: 2022-09-20
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Publication No.: US20230152750A1Publication Date: 2023-05-18
- Inventor: Junren WANG , Xiayu FENG , Mengfei WANG , Lu LU
- Applicant: Meta Platforms Technologies, LLC
- Applicant Address: US CA Menlo Park
- Assignee: Meta Platforms Technologies, LLC
- Current Assignee: Meta Platforms Technologies, LLC
- Current Assignee Address: US CA Menlo Park
- Main IPC: G03H1/04
- IPC: G03H1/04 ; G02B5/32 ; G02B27/01 ; G02B5/30

Abstract:
A method includes providing a radiation with a predetermined intensity profile. The method also includes providing a photo-sensitive medium layer including a mixture of a photo-sensitive material and an absorbing additive. The absorbing additive has a predetermined non-uniform distribution in at least one of a direction within a film plane or a thickness direction of the photo-sensitive medium layer. The predetermined non-uniform distribution of the absorbing additive is configured to result in a predetermined non-uniform absorption of the radiation. The method also includes exposing the photo-sensitive medium layer to the radiation to form a polymer film. The optical film includes at least one predetermined birefringence variation in at least one of a direction within a film plane or a thickness direction of the polymer film.
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