Invention Application
- Patent Title: SYSTEMS AND METHODS FOR LASER PROCESSING SYSTEM CHARACTERIZATION AND CALIBRATION
-
Application No.: US17241888Application Date: 2021-04-27
-
Publication No.: US20220339705A1Publication Date: 2022-10-27
- Inventor: Layton Seth Travis , Nicholas E. Buhr
- Applicant: General Electric Company
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Main IPC: B22F10/31
- IPC: B22F10/31 ; B22F10/85 ; B22F12/41 ; B22F12/49 ; B22F12/90 ; B33Y10/00 ; B33Y50/02 ; B33Y30/00

Abstract:
A method of characterizing an optical system of a laser processing system includes directing an energy beam through a plurality of portions of a sample by adjusting an orientation of an adjustable beam redirection element of the optical system in accordance with a predetermined movement pattern to form a plurality of test patterns in the sample at each portion. The optical system comprises an imaging system having an expected focal position. In the movement pattern, the energy beam is directed in a plurality of different directions in the sample in the formation of each test pattern. At least two of the plurality of test patterns are formed at different calibration distances from an expected focal position of the optical system. An accuracy of the expected focal position is determined by detecting a level of modification in the sample caused by the energy beam at the plurality of test patterns.
Public/Granted literature
- US12097558B2 Systems and methods for laser processing system characterization and calibration Public/Granted day:2024-09-24
Information query