- 专利标题： CLEANING COMPOSITION
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申请号： US17720580申请日： 2022-04-14
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公开(公告)号： US20220336210A1公开(公告)日： 2022-10-20
- 发明人: Jun Liu , Michael L. White , Daniela White , Emanuel I. Cooper
- 申请人： ENTEGRIS, INC.
- 申请人地址： US MA Billerica
- 专利权人： ENTEGRIS, INC.
- 当前专利权人： ENTEGRIS, INC.
- 当前专利权人地址： US MA Billerica
- 主分类号： H01L21/02
- IPC分类号： H01L21/02
摘要：
Provided are compositions useful for the cleaning of microelectronic device structures. The residues may include post-CMP, post-etch, post-ash residues, pad and brush debris, metal and metal oxide particles and precipitated metal organic complexes such as copper-benzotriazole complexes. Advantageously, the compositions as described herein show improved aluminum, cobalt, and copper compatibility.
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