- 专利标题： COMPOSITIONS FOR REMOVING ETCH RESIDUES, METHODS OF USING AND USE THEREOF
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申请号： US17597530申请日： 2020-07-14
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公开(公告)号： US20220251480A1公开(公告)日： 2022-08-11
- 发明人: Laisheng Sun , LILI WANG , ALPING WU , YI-CHIA LEE , TIANNIU R. CHEN
- 申请人： Versum Materials US, LLC
- 申请人地址： US AZ Tempe
- 专利权人： Versum Materials US, LLC
- 当前专利权人： Versum Materials US, LLC
- 当前专利权人地址： US AZ Tempe
- 国际申请： PCT/US2020/041881 WO 20200714
- 主分类号： C11D7/32
- IPC分类号： C11D7/32 ; C11D7/26 ; C11D11/00 ; G03F7/42
摘要：
This disclosed and claimed subject matter relates to a post etch residue cleaning compositions that include an alkanolamine having two or more or more than two alkanol groups, an alpha-hydroxy acid and water as well as methods for use thereof in microelectronics manufacturing.
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