Invention Application
- Patent Title: PROCESS APPARATUS INCLUDING GAS SUPPLIER AND METHOD OF OPERATING THE SAME
-
Application No.: US17411640Application Date: 2021-08-25
-
Publication No.: US20220243334A1Publication Date: 2022-08-04
- Inventor: Dongsik Yang , Hyukjae Kwon , Minseok Koo , Sukeun Kuk , Sehyeong Oh , Hyun Chul Lee , Sangmin Ji
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2021-0015650 20210203
- Main IPC: C23C16/52
- IPC: C23C16/52 ; C23C16/448

Abstract:
A process apparatus includes a gas supplier which supplies a reaction gas having a constant concentration, and a processor which performs a predetermined process by the reaction gas supplied from the gas supplier, where the gas supplier includes a reactor which accommodates a solid phase reactant, a heater which applies heat to the solid phase reactant to convert the solid phase reactant to a reaction gas in a gas phase, a gas pump which applies a predetermined pumping pressure to the reactor, and a gas outlet which discharges the reaction gas to the processor.
Public/Granted literature
- US12128395B2 Process apparatus including gas supplier and method of operating the same Public/Granted day:2024-10-29
Information query
IPC分类: