Invention Application
- Patent Title: INSPECTION APPARATUS LITHOGRAPHIC APPARATUS MEASUREMENT METHOD
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Application No.: US17433897Application Date: 2020-01-28
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Publication No.: US20220187719A1Publication Date: 2022-06-16
- Inventor: Bas Johannes Petrus ROSET , Johannes Hendrik Everhardus MUJDERMAN , Benjamin Cunnegonda Henric SMEETS
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP19159362.3 20190226
- International Application: PCT/EP2020/051998 WO 20200128
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
The invention provides an inspection apparatus for inspecting an object, the apparatus comprising: a measurement system configured to measure: —a first parameter of the object across an area of interest of the object, and —a second parameter, different from the first parameter, of the object at a plurality of locations on the object; a stage apparatus configured to position the object relative to the measurement system during a measurement of the first parameter, wherein the measurement system is configured to measure the second parameter at the plurality of different locations during the measurement of the first parameter and wherein the stage apparatus is configured to position the object relative to the measurement system based on a compliance characteristic of the stage apparatus.
Public/Granted literature
- US11914307B2 Inspection apparatus lithographic apparatus measurement method Public/Granted day:2024-02-27
Information query
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