- 专利标题: REDISTRIBUTION LAYER STRUCTURES FOR INTEGRATED CIRCUIT PACKAGE
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申请号: US17366575申请日: 2021-07-02
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公开(公告)号: US20210351130A1公开(公告)日: 2021-11-11
- 发明人: Jie CHEN , Ying-Ju CHEN , Hsien-Wei CHEN , Der-Chyang YEH , Chen-Hua YU
- 申请人: Taiwan Semiconductor Manufacturing Co., Ltd
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Co., Ltd
- 当前专利权人: Taiwan Semiconductor Manufacturing Co., Ltd
- 当前专利权人地址: TW Hsinchu
- 主分类号: H01L23/528
- IPC分类号: H01L23/528 ; H01L23/00 ; H01L25/10 ; H01L23/522 ; H01L25/00
摘要:
A method of forming an integrated circuit (IC) package with improved performance and reliability is disclosed. The method includes forming a singulated IC die, coupling the singulated IC die to a carrier substrate, and forming a routing structure. The singulated IC die has a conductive via and the conductive via has a peripheral edge. The routing structure has a conductive structure coupled to the conductive via. The routing structure further includes a cap region overlapping an area of the conductive via, a routing region having a first width from a top-down view, and an intermediate region having a second width from the top-down view along the peripheral edge of the conductive via. The intermediate region is arranged to couple the cap region to the routing region and the second width is greater than the first width.
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