The present disclosure provides a photoresist and a preparation method thereof. The photoresist includes at least one kind of resin, a photoinitiator, a solvent, and at least one kind of scattering particle, and the at least one kind of scattering particle being configured to scatter ultraviolet light irradiated into the photoresist. The present disclosure may increase an exposure energy that the photoresist obtains during an exposure process, and thereby may reduce an exposure time required for the photoresist.