Invention Application
- Patent Title: Solid Precursor, Apparatus for Supplying Source Gas and Deposition Device Having the Same
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Application No.: US16019907Application Date: 2018-06-27
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Publication No.: US20190186002A1Publication Date: 2019-06-20
- Inventor: Hasan Musarrat , So Young Lee , Ik Soo Kim , Jang Hee Lee
- Applicant: Samsung Electronics Co., Ltd.
- Priority: KR10-2017-0173486 20171215
- Main IPC: C23C16/448
- IPC: C23C16/448 ; C23C16/455

Abstract:
A source gas supply unit includes a canister including a precursor accommodating space therein, and an inflow surface and an outflow surface which are open. The source gas supply unit includes a first lid configured to seal the inflow surface of the canister and having a gas inlet connected to the precursor accommodating space and a second lid configured to seal the outflow surface of the canister and having a gas outlet connected to the precursor accommodating space. The source gas supply unit includes a ring-shaped solid precursor located in the precursor accommodating space and including a gas flow path therein, which communicates with the gas inlet and the gas outlet. A cross-sectional area of the gas flow path increases from the inflow surface of the canister toward the outflow surface thereof.
Information query
IPC分类: