Invention Application
- Patent Title: COMPOSITION FOR FORMING COATING FILM AND METHOD FOR FORMING COATING FILM USING SAME
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Application No.: US15567846Application Date: 2016-03-23
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Publication No.: US20180201736A1Publication Date: 2018-07-19
- Inventor: Shinji KAWATO
- Applicant: AZ Electronic Materials (Luxembourg) S.a.r.l.
- Priority: JP2015-086203 20150420
- International Application: PCT/EP2016/000500 WO 20160323
- Main IPC: C08G77/62
- IPC: C08G77/62 ; C08K5/544 ; C08K5/5425 ; C08K5/5419 ; C08L83/16 ; C08J5/18 ; C08J3/28 ; C09D183/16 ; C09D183/14

Abstract:
[Problem] To provide a composition for forming a coating layer having excellent gas barrier performance and a method of forming the coating layer. [Means for Solution] A composition for forming a coating film comprising a specific silicon compound which reacts with a polysilazane by exposure, a polysilazane and an organic solvent, and a method for forming a coating layer comprising coating the composition on a substrate and exposing.
Information query