Invention Application
- Patent Title: ALD Process For NiO Film With Tunable Carbon Content
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Application No.: US15863348Application Date: 2018-01-05
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Publication No.: US20180195170A1Publication Date: 2018-07-12
- Inventor: Jeffrey W. Anthis , Ghazal Saheli , Feng Q. Liu , David Thompson
- Applicant: Applied Materials, Inc.
- Main IPC: C23C16/40
- IPC: C23C16/40 ; C23C16/455
Abstract:
Processing methods comprising exposing a substrate to a first reactive gas comprising a cyclopentadienyl nickel complex and a second reactive gas comprising a sub-saturative amount of oxygen to form a nickel oxide film with a carbon content in the range of about 2 to about 10 atomic percent are described.
Information query
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