- 专利标题: SCANNING WHITE-LIGHT INTERFEROMETRY SYSTEM FOR CHARACTERIZATION OF PATTERNED SEMICONDUCTOR FEATURES
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申请号: US15388794申请日: 2016-12-22
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公开(公告)号: US20180156597A1公开(公告)日: 2018-06-07
- 发明人: Nigel P. Smith , George Andrew Antonelli
- 申请人: Nanometrics Incorporated
- 主分类号: G01B9/02
- IPC分类号: G01B9/02
摘要:
A white light interferometric metrology device operates in the image plane and objective pupil plane. The interferometric metrology device extracts the electric field with complex parameters and that is a function of azimuth angle, angle of incidence and wavelength from interferometric data obtained from the pupil plane. Characteristics of the sample are determined using the electric field based on an electric field model of the azimuth angle, the angle of incidence and the wavelength that is specific for a zero diffraction order. A center of the pupil in the pupil plane may be determined based on a Fourier transform of the interferometric data at each new measurement and used to convert each pixel from the camera imaging the objective pupil plane into a unique set of angle of incidence and azimuth angle of light incident on the sample.
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