INTERCONNECT METAL LAYOUT FOR INTEGRATED CIRCUIT
Abstract:
A semiconductor device includes an active region comprising a source/drain region and a plurality of poly strips spaced apart and arranged along a first direction crossing over the active region. The first direction is substantially perpendicular to a lengthwise direction of the active region. A first metal pattern is disposed on the poly strips and arranged along the first direction. A plurality of first interconnect plugs is interposed in between the poly strips and the first metal pattern and in between the active region and the first metal pattern. A position of the first interconnect plugs being variable along the first direction.
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