Invention Application
- Patent Title: Symmetrical Plural-Coil Plasma Source with Side Rf Feeds and Rf Distribution Plates
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Application No.: US15867559Application Date: 2018-01-10
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Publication No.: US20180138014A1Publication Date: 2018-05-17
- Inventor: James D. Carducci , Kenneth S. Collins , Richard Fovell , Jason A. Kenney , Kartik Ramaswamy , Shahid Rauf
- Applicant: Applied Materials, Inc.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H05H1/46 ; C23C16/505
Abstract:
A plasma reactor has an overhead inductively coupled plasma source with two coil antennas and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
Public/Granted literature
- US10811226B2 Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates Public/Granted day:2020-10-20
Information query
