- 专利标题: METHOD OF IRRADIATING ELECTROMAGNETIC PULSE AND ELECTROMAGNETIC PULSE IRRADIATING SYSTEM
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申请号: US15564130申请日: 2016-04-14
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公开(公告)号: US20180080747A1公开(公告)日: 2018-03-22
- 发明人: Shingo NISHIKATA , Yoshikatsu KURODA , Hiroshi IKEBUCHI , Koichi HAMAMOTO , Tomoya MORIOKA , Atsushi OCHIAI
- 申请人: MITSUBISHI HEAVY INDUSTRIES, LTD.
- 优先权: JP2015-131595 20150630
- 国际申请: PCT/JP2016/061998 WO 20160414
- 主分类号: F41H13/00
- IPC分类号: F41H13/00 ; F41H11/02
摘要:
A method of irradiating an electromagnetic pulse includes specifying a position of a target having electronic equipment; setting the light-condensing point based on the position of the target; and condensing the laser beam to generate plasma in the light-condensing point such that the electromagnetic pulse generated from the plasma is irradiated to the electronic equipment. In this way, a method and system for irradiating an electromagnetic pulse are realized which can irradiate the electromagnetic pulse of a large output while restraining diffusion of the electromagnetic pulse.
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