An inline thermal treatment system for thermally treating a continuous conductive product includes a first electrode configured to contact a continuous conductive product and a second electrode configured to contact the continuous conductive product such that a portion of the continuous conductive product is disposed between the first and second electrodes. The inline thermal treatment system includes a power source coupled to the first electrode and to the second electrode, wherein the power source is configured to apply an electrical bias between the first electrode and the second electrode to resistively heat the portion of the continuous conductive product disposed between the first and second electrodes.