Invention Application
- Patent Title: STRAIN AND PRESSURE SENSING DEVICE, MICROPHONE, METHOD FOR MANUFACTURING STRAIN AND PRESSURE SENSING DEVICE, AND METHOD FOR MANUFACTURING MICROPHONE
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Application No.: US15701633Application Date: 2017-09-12
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Publication No.: US20180009656A1Publication Date: 2018-01-11
- Inventor: Hideaki FUKUZAWA , Tatsuya OHGURO , Akihiro KOJIMA , Yoshiaki SUGIZAKI , Mariko TAKAYANAGI , Yoshihiko FUJI , Akio HORI , Michiko HARA
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Priority: JP2011-211212 20110927
- Main IPC: B81C1/00
- IPC: B81C1/00 ; G01L9/00 ; H04R19/00 ; H04R1/08 ; H04R31/00 ; H04R19/04

Abstract:
According to one embodiment, a strain and pressure sensing device includes a semiconductor circuit unit and a sensing unit. The semiconductor circuit unit includes a semiconductor substrate and a transistor. The transistor is provided on a semiconductor substrate. The sensing unit is provided on the semiconductor circuit unit, and has space and non-space portions. The non-space portion is juxtaposed with the space portion. The sensing unit further includes a movable beam, a strain sensing element unit, and first and second buried interconnects. The movable beam has fixed and movable portions, and includes first and second interconnect layers. The fixed portion is fixed to the non-space portion. The movable portion is separated from the transistor and extends from the fixed portion into the space portion. The strain sensing element unit is fixed to the movable portion. The first and second buried interconnects are provided in the non-space portion.
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