Invention Application
- Patent Title: METAL OXIDE METAL FIELD EFFECT TRANSISTORS (MOMFETS)
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Application No.: US15506205Application Date: 2014-09-26
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Publication No.: US20170358658A1Publication Date: 2017-12-14
- Inventor: Rafael RIOS , Kelin J. KUHN , Seiyon KIM , Justin R. Weber
- Applicant: INTEL CORPORATION
- International Application: PCT/US2014/057867 WO 20140926
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/06 ; H01L29/423

Abstract:
Embodiments of the invention include metal oxide metal field effect transistors (MOMFETs) and methods of making such devices. In embodiments, the MOMFET device includes a source and a drain with a channel disposed between the source and the drain. According to an embodiment, the channel has at least one confined dimension that produces a quantum confinement effect in the channel. In an embodiment, the MOMFET device also includes a gate electrode that is separated from the channel by a gate dielectric. According to embodiments, the band-gap energy of the channel may be modulated by changing the size of the channel, the material used for the channel, and/or the surface termination applied to the channel. Embodiments also include forming an type device and a P-type device by controlling the work-function of the source and drain relative to the conduction band and valance band energies of the channel.
Information query
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