- 专利标题: CHOLATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
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申请号: US15614376申请日: 2017-06-05
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公开(公告)号: US20170285470A1公开(公告)日: 2017-10-05
- 发明人: Emad Aqad , Mingqi Li , Joseph Mattia , Cheng-Bai Xu
- 申请人: Rohm and Haas Electronic Materials LLC
- 申请人地址: US MA Marlborough US MA Marlborough
- 专利权人: Rohm and Haas Electronic Materials LLC,Rohm and Haas Electronic Materials LLC
- 当前专利权人: Rohm and Haas Electronic Materials LLC,Rohm and Haas Electronic Materials LLC
- 当前专利权人地址: US MA Marlborough US MA Marlborough
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; C07J31/00 ; C07C381/12
摘要:
New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.
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