- 专利标题： MOLD, METHOD FOR PRODUCING A MOLD, AND METHOD FOR FORMING A MOLD ARTICLE
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申请号： US15469640申请日： 2017-03-27
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公开(公告)号： US20170197865A1公开(公告)日： 2017-07-13
- 发明人: Guenter Denifl , Alexander Breymesser , Markus Kahn , Andre Brockmeier
- 申请人： Infineon Technologies Austria AG
- 主分类号： C03B19/02
- IPC分类号： C03B19/02 ; B29C33/60 ; C03B40/00 ; B29C33/56 ; C03B11/06
摘要：
Various embodiments provide a mold including a pyrolytic carbon film disposed at a surface of the mold. Various embodiments relate to using a low pressure chemical vapor deposition process (LPCVD) or using a physical vapor deposition (PVD) process in order to form a pyrolytic carbon film at a surface of a mold.
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