• 专利标题: ELECTROCHEMICAL MACHINING APPARATUS WITH CLAMPING DEVICE AND ELECTRODE ALIGNED IN THE SAME DIRECTION
  • 申请号: US15271212
    申请日: 2016-09-20
  • 公开(公告)号: US20170151617A1
    公开(公告)日: 2017-06-01
  • 发明人: Yung-Fang TSAIYao-Chung HSIEH
  • 申请人: INTAI TECHNOLOGY CORP.
  • 优先权: TW104139617 20151127
  • 主分类号: B23H3/00
  • IPC分类号: B23H3/00 B23H9/06
ELECTROCHEMICAL MACHINING APPARATUS WITH CLAMPING DEVICE AND ELECTRODE ALIGNED IN THE SAME DIRECTION
摘要:
An electrochemical machining apparatus with a clamping device and an electrode aligned in the same direction includes a platen, a lower seat, an anode electrode and a cathode electrode. The platen and the lower seat are located relatively for clamping. A working space is formed between the platen and the lower seat for allowing a workpiece to be placed therein. The anode electrode is disposed on the platen and is electrically connected to the workpiece. The cathode electrode is disposed inside the lower seat and is corresponding to the working space. An isolation layer is disposed between the cathode electrode and the lower seat to avoid an electrical connection. A working gap with a constant distance is preserved between the cathode electrode and the workpiece for allowing an electrolyte to flow therethrough and performing electrochemical machining.
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