Invention Application
- Patent Title: CARRIER SUBSTRATE
- Patent Title (中): 载体基板
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Application No.: US15298234Application Date: 2016-10-20
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Publication No.: US20170047295A1Publication Date: 2017-02-16
- Inventor: Yuan-Fu Lan , Hsien-Wen Hsu
- Applicant: Powertech Technology Inc.
- Applicant Address: TW Hsinchu County
- Assignee: Powertech Technology Inc.
- Current Assignee: Powertech Technology Inc.
- Current Assignee Address: TW Hsinchu County
- Priority: TW104126612 20150814
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H05K1/18 ; H01L23/498

Abstract:
A carrier substrate includes an insulation encapsulation, first conductive patterns, second conductive patterns, at least one first dummy pattern, and at least one second dummy pattern. The carrier substrate has a first layout region and a second layout region. The first conductive patterns and the first dummy pattern are located in the first layout region. The second conductive patterns and the second dummy pattern are located in the second layout region. The first and second conductive patterns and the first and second dummy patterns are embedded in the insulation encapsulation. The insulation encapsulation exposes top surfaces of the first and second conductive patterns and the first and second dummy patterns. The first dummy pattern and the second dummy pattern are insulated from the first conductive patterns and the second conductive patterns. An edge profile of the first dummy pattern facing the second dummy pattern is non-linear.
Public/Granted literature
- US09659884B2 Carrier substrate Public/Granted day:2017-05-23
Information query
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