Invention Application
US20170003218A1 SYSTEM AND METHOD FOR MEASURING CONCENTRATION OF A TRACE GAS IN A GAS MIXTURE
有权
用于测量气体混合气中气体浓度的系统和方法
- Patent Title: SYSTEM AND METHOD FOR MEASURING CONCENTRATION OF A TRACE GAS IN A GAS MIXTURE
- Patent Title (中): 用于测量气体混合气中气体浓度的系统和方法
-
Application No.: US14278335Application Date: 2014-05-15
-
Publication No.: US20170003218A1Publication Date: 2017-01-05
- Inventor: Rachit Sharma , Chayan Mitra , Sandip Maity , Vinayak Tilak , Xiaoyong Liu , Anthony Kowal , Chong Tao
- Applicant: General Electric Company
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Main IPC: G01N21/39
- IPC: G01N21/39 ; G01N21/03 ; G01N21/27

Abstract:
A method includes receiving a gas mixture at a first pressure including at least a primary gas and a secondary gas and changing a pressure of the received gas mixture from the first pressure to a second pressure. Further, the method includes determining a spectra of the gas mixture at the second pressure, wherein at least the first spectral line of the primary gas is spectrally distinguished from at least the second spectral line of the secondary gas, identifying a peak wavelength associated with the spectrally distinguished first spectral line of the primary gas based on at least two wavelengths of the secondary gas corresponding to at least two peak amplitudes in the spectra of the gas mixture, and determining a concentration of the primary gas based on the identified peak wavelength associated with the spectrally distinguished first spectral line of the primary gas.
Public/Granted literature
- US10024787B2 System and method for measuring concentration of a trace gas in a gas mixture Public/Granted day:2018-07-17
Information query
IPC分类: