Invention Application
US20160257784A1 XYLYLENEDIAMINE COMPOSITION AND METHOD FOR PRODUCING POLYAMIDE RESIN
有权
XYLYLEDEDAMINE组合物和生产聚酰胺树脂的方法
- Patent Title: XYLYLENEDIAMINE COMPOSITION AND METHOD FOR PRODUCING POLYAMIDE RESIN
- Patent Title (中): XYLYLEDEDAMINE组合物和生产聚酰胺树脂的方法
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Application No.: US15032029Application Date: 2014-10-29
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Publication No.: US20160257784A1Publication Date: 2016-09-08
- Inventor: Tatsuya TOCHIHARA , Katsumi SHINOHARA , Takashi NAKAMURA , Hajime YAMADA , Jun MITADERA , Takashi YAMAMOTO
- Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Priority: JP2013-227231 20131031; JP2013-227244 20131031
- International Application: PCT/JP2014/078732 WO 20141029
- Main IPC: C08G69/06
- IPC: C08G69/06 ; C08G59/50

Abstract:
Provided are [1] a xylylenediamine composition containing xylylenediamine and 1,2-ditolylethane wherein the content of 1,2-ditolylethane is 0.001 to 0.02 parts by mass based on 100 parts by mass of the xylylenediamine; and [2] a method for producing a polyamide resin including the steps of introducing a diamine containing xylylenediamine, a dicarboxylic acid, and 1,2-ditolylethane into a reaction system and performing polycondensation reaction, wherein the amount of the 1,2-ditolylethane to be introduced is 0.001 to 0.02 parts by mass based on 100 parts by mass of the xylylenediamine.
Public/Granted literature
- US09783638B2 Xylylenediamine composition and method for producing polyamide resin Public/Granted day:2017-10-10
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