发明申请
US20160186311A1 METHODS OF FORMING MOLYBDENUM SPUTTERING TARGETS 有权
形成莫氏体溅射目标的方法

METHODS OF FORMING MOLYBDENUM SPUTTERING TARGETS
摘要:
In various embodiments, sputtering targets are formed by introducing molybdenum powder into a sheet bar mold, pressing the powder to form a sheet bar, sintering the sheet bar to form an ingot having a density of at least 90% of a theoretical density, preheating the ingot, rolling the ingot to form a plate, and heat treating the plate.
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