发明申请
- 专利标题: METHODS OF FORMING MOLYBDENUM SPUTTERING TARGETS
- 专利标题(中): 形成莫氏体溅射目标的方法
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申请号: US15061566申请日: 2016-03-04
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公开(公告)号: US20160186311A1公开(公告)日: 2016-06-30
- 发明人: Brad Lemon , Joseph Hirt , Timothy Welling , James G. Daily, III , David Meendering , Gary Rozak , Jerome O'Grady , Prabhat Kumar , Steven A. Miller , Rong-chein Richard Wu , David G. Schwartz
- 申请人: Brad Lemon , Joseph Hirt , Timothy Welling , James G. Daily, III , David Meendering , Gary Rozak , Jerome O'Grady , Prabhat Kumar , Steven A. Miller , Rong-chein Richard Wu , David G. Schwartz
- 主分类号: C23C14/34
- IPC分类号: C23C14/34 ; B22F1/00 ; B22F3/16 ; C21D8/02 ; B22F5/00 ; C22F1/18 ; C22C27/04 ; C23C14/14 ; B22F3/24
摘要:
In various embodiments, sputtering targets are formed by introducing molybdenum powder into a sheet bar mold, pressing the powder to form a sheet bar, sintering the sheet bar to form an ingot having a density of at least 90% of a theoretical density, preheating the ingot, rolling the ingot to form a plate, and heat treating the plate.
公开/授权文献
- US09926623B2 Methods of forming molybdenum sputtering targets 公开/授权日:2018-03-27
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