Invention Application
US20160122986A1 SYSTEM FOR SUPPLYING ADDITIVE FLUIDS WITHIN A WASTE DISPOSAL WATER SUPPLY SYSTEM
审中-公开
用于在废水处理水供应系统中供应添加剂的系统
- Patent Title: SYSTEM FOR SUPPLYING ADDITIVE FLUIDS WITHIN A WASTE DISPOSAL WATER SUPPLY SYSTEM
- Patent Title (中): 用于在废水处理水供应系统中供应添加剂的系统
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Application No.: US14532070Application Date: 2014-11-04
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Publication No.: US20160122986A1Publication Date: 2016-05-05
- Inventor: Joseph Emil Gormley , Jedediah Taylor Dawson
- Applicant: General Electric Company
- Main IPC: E03C1/266
- IPC: E03C1/266 ; A61L11/00 ; B02C23/20

Abstract:
In one aspect, a water supply system for a waste disposal may generally include a supply conduit configured to be fluidly connected to a water supply, wherein the supply conduit has a discharge end. The system may also include a disposal conduit in fluid communication with the supply conduit and a supplementary conduit in fluid communication with a storage tank containing an additive fluid. The supplementary conduit may be configured to supply the additive fluid into the flow of water directed through the disposal conduit to create a water/additive fluid mixture within the disposal conduit. Moreover, an outlet end of the disposal conduit may be configured to be in fluid communication with a disposal inlet of the waste disposal such that the water/additive fluid mixture directed through the disposal conduit is received within the waste disposal.
Public/Granted literature
- US10035150B2 System for supplying additive fluids within a waste disposal water supply system Public/Granted day:2018-07-31
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