发明申请
- 专利标题: ANNEAL TECHNIQUES FOR CHALCOGENIDE SEMICONDUCTORS
- 专利标题(中): 氯化铝半导体的绝缘技术
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申请号: US14499116申请日: 2014-09-27
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公开(公告)号: US20160093762A1公开(公告)日: 2016-03-31
- 发明人: Sunit S. Mahajan , Teodor K. Todorov
- 申请人: International Business Machines Corporation
- 主分类号: H01L31/18
- IPC分类号: H01L31/18 ; C23C16/52 ; C23C16/46 ; H01L31/032 ; C23C16/455
摘要:
Techniques for precisely controlling the composition of volatile components (such as sulfur (S), selenium (Se), and tin (Sn)) of chalcogenide semiconductors in real-time—during production of the material are provided. In one aspect, a method for forming a chalcogenide semiconductor material includes providing a S source(s) and a Se source(s); heating the S source(s) to form a S-containing vapor; heating the Se source(s) to form a Se-containing vapor; passing a carrier gas first through the S-containing vapor and then through the Se-containing vapor, wherein the S-containing vapor and the Se-containing vapor are transported via the carrier gas to a sample; and contacting the S-containing vapor and the Se-containing vapor with the sample under conditions sufficient to form the chalcogenide semiconductor material. A multi-chamber processing apparatus is also provided.
公开/授权文献
- US09349906B2 Anneal techniques for chalcogenide semiconductors 公开/授权日:2016-05-24
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