发明申请
- 专利标题: ARRAY SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, DISPLAY DEVICE
- 专利标题(中): 阵列基板,其制造方法,显示装置
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申请号: US14418161申请日: 2014-04-30
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公开(公告)号: US20160005766A1公开(公告)日: 2016-01-07
- 发明人: Hyun Sic Choi , Hee Cheol Kim
- 申请人: BOE TECHNOLOGY GROUP CO., LTD.
- 申请人地址: CN Beijing
- 专利权人: BOE Technology Group Co., Ltd.
- 当前专利权人: BOE Technology Group Co., Ltd.
- 当前专利权人地址: CN Beijing
- 优先权: CN201310717853.2 20131223
- 国际申请: PCT/CN2014/076608 WO 20140430
- 主分类号: H01L27/12
- IPC分类号: H01L27/12 ; H01L21/56 ; H01L21/768 ; H01L23/538
摘要:
The embodiments of the present invention disclose an array substrate, a method for manufacturing the same, and a display device. With the solutions of the embodiments, aperture rate is increased, and gate signal delay caused by increased connection resistance of gate line is alleviated. The array substrate of the present invention includes a thin film transistor; a substrate; a common electrode provided on the substrate; a gate line comprising a plurality of separate segments arranged to be spaced apart from each other and connected with each other through a bridge; and a common electrode line provided to be spaced apart from the gate line, the gate line and the common electrode line being in the same layer, wherein the common electrode line comprises a connection segment extending through a gap between separate segments to electrically connect with the common electrode directly.
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