发明申请
- 专利标题: SELF-ASSEMBLED STRUCTURE AND MEMBRANE COMPRISING BLOCK COPOLYMER AND PROCESS FOR PRODUCING THE SAME BY SPIN COATING (IVa)
- 专利标题(中): 包含嵌段共聚物的自组装结构和膜和由旋涂制成的方法(Ⅳa)
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申请号: US14292255申请日: 2014-05-30
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公开(公告)号: US20150344637A1公开(公告)日: 2015-12-03
- 发明人: Khaled Abdel-Hakim Helmy AAMER , Selina SHI
- 申请人: Pall Corporation
- 主分类号: C08G81/00
- IPC分类号: C08G81/00 ; B01D71/64
摘要:
Disclosed are self-assembled structures prepared from block copolymers, for example, diblock copolymers of the formula (I): wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. In an embodiment, the block copolymer self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such self-assembled structures which involves spin coating a polymer solution containing the block copolymer to obtain a thin film, followed by solvent annealing of the film. Further disclosed is a method of preparing porous membranes from the self-assembled structures.
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