发明申请
US20150321386A1 MOLD RELEASE TREATMENT METHOD AND METHOD FOR PRODUCING ANTI-REFLECTIVE FILM
有权
用于生产抗反射膜的模具释放处理方法和方法
- 专利标题： MOLD RELEASE TREATMENT METHOD AND METHOD FOR PRODUCING ANTI-REFLECTIVE FILM
- 专利标题（中）： 用于生产抗反射膜的模具释放处理方法和方法
-
申请号： US14387623申请日： 2013-03-25
-
公开(公告)号： US20150321386A1公开(公告)日： 2015-11-12
- 发明人: Hidekazu HAYASHI
- 申请人： Sharp Kabushiki Kaisha
- 申请人地址： JP Osaka-shi, Osaka
- 专利权人： SHARP KABUSHIKI KAISHA
- 当前专利权人： SHARP KABUSHIKI KAISHA
- 当前专利权人地址： JP Osaka-shi, Osaka
- 优先权： JP2012-069229 20120326
- 国际申请： PCT/JP2013/058531 WO 20130325
- 主分类号： B29C33/62
- IPC分类号： B29C33/62 ; B29C59/02 ; B29C33/42 ; B29C59/16
摘要：
A mold release processing method according to an embodiment of the present invention includes the steps of: (a) providing a mold releasing agent, including a fluorine-based silane coupling agent and a solvent, and a mold of which the surface has a porous alumina layer; (b) applying the mold releasing agent onto the surface; and (c) heating, either before or after the step (b), the surface to a temperature not less than 40° C. and less than 100° C. in an ambient with a relative humidity of 50% or more.
公开/授权文献
信息查询
