A plasma device including a casing, a first electrode, a second electrode, a nozzle and a gas ejection port is provided. The casing has a first chamber. The first electrode is disposed within the first chamber and has a second chamber. The second electrode capable of rotating in relative to the casing has a third chamber connected with the second chamber. The second chamber and the third chamber are adapted for accommodating plasma formed between the first electrode and the second electrode. The nozzle and the gas ejection port are independently disposed at the bottom of the second electrode respectively, wherein the nozzle is configured to eject the plasma, and forms an included angle with or is spaced a distance apart from a rotating axis of the second electrode. The gas ejection port is configured to eject cold gas.