Invention Application
- Patent Title: MANUFACTURE OF COATED COPPER PILLARS
- Patent Title (中): 涂层铜管的制造
-
Application No.: US14429364Application Date: 2013-07-19
-
Publication No.: US20150279797A1Publication Date: 2015-10-01
- Inventor: Thomas Beck , Gerhard Steinberger , Andreas Walter
- Applicant: ATOTECH DEUTSCHLAND GMBH
- Priority: EP12185004.4 20120919
- International Application: PCT/EP2013/065296 WO 20130719
- Main IPC: H01L23/00
- IPC: H01L23/00

Abstract:
The present invention relates to a method for forming a copper pillar on a semiconducting substrate, the copper pillar having an underbump metallization area comprising a metal less noble than copper and optionally a solder bump on the top portion, and having a layer of a second metal selected from tin, tin alloys, silver, and silver alloys deposited onto the side walls of said copper pillar. A layer of a first metal which is more noble than copper is deposited onto the entire outer surface of the copper pillar prior to deposition of the second metal layer. The layer of a second metal then has at least a reduced number of undesired pin-holes and serves as a protection layer for the underlying copper pillar.
Public/Granted literature
- US09331040B2 Manufacture of coated copper pillars Public/Granted day:2016-05-03
Information query
IPC分类: