Invention Application
- Patent Title: POSITION MEASURING APPARATUS, POSITION MEASURING METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Patent Title (中): 位置测量装置,位置测量方法,平面设备和装置制造方法
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Application No.: US14427287Application Date: 2013-09-20
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Publication No.: US20150219438A1Publication Date: 2015-08-06
- Inventor: Arie Jeffrey Den Boef , Justin Lloyd Kreuzer , Simon Gijsbert Josephus Mathijssen , Gerrit Johannes Nijmeijer , J. Christian Swindal , Patricius Aloysius Jacobus Tinnemans , Richard Johannes Franciscus Van Haren
- Applicant: ASML Netherlands B.V. , ASML Holding N.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- International Application: PCT/EP2013/069540 WO 20130920
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G03F7/20 ; H01L21/66

Abstract:
An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.
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