Invention Application
US20150015122A1 PIEZOELECTRIC/ELECTROSTRICTIVE FILM TYPE ELEMENT AND METHOD FOR PRODUCING PIEZOELECTRIC/ELECTROSTRICTIVE FILM TYPE ELEMENT 有权
压电/电绝缘膜类型元件和压电/电绝缘膜型元件的制造方法

  • Patent Title: PIEZOELECTRIC/ELECTROSTRICTIVE FILM TYPE ELEMENT AND METHOD FOR PRODUCING PIEZOELECTRIC/ELECTROSTRICTIVE FILM TYPE ELEMENT
  • Patent Title (中): 压电/电绝缘膜类型元件和压电/电绝缘膜型元件的制造方法
  • Application No.: US14499598
    Application Date: 2014-09-29
  • Publication No.: US20150015122A1
    Publication Date: 2015-01-15
  • Inventor: Takaaki KOIZUMITomohiko HIBINOTakashi EBIGASE
  • Applicant: NGK Insulators, Ltd.
  • Priority: JP2012-079467 20120330
  • Main IPC: H01L41/187
  • IPC: H01L41/187 H01L41/047
PIEZOELECTRIC/ELECTROSTRICTIVE FILM TYPE ELEMENT AND METHOD FOR PRODUCING PIEZOELECTRIC/ELECTROSTRICTIVE FILM TYPE ELEMENT
Abstract:
Provided is a piezoelectric/electrostrictive film type element in which the film thickness of the piezoelectric/electrostrictive film is small, the piezoelectric/electrostrictive film is dense, and the piezoelectric/electrostrictive film has good durability and insulation quality. The piezoelectric/electrostrictive film type element includes a substrate, a lower electrode film, a piezoelectric/electrostrictive film and an upper electrode film. The substrate and the lower electrode film are fixed adherently each other. The film thickness of the piezoelectric/electrostrictive film is 5 μm or less. The piezoelectric/electrostrictive film is composed of a piezoelectric/electrostrictive ceramic. The piezoelectric/electrostrictive ceramic contains lead zirconate titanate and a bismuth compound. The bismuth/lead ratio in the peripheral section inside the grain which is relatively close to the grain boundary is greater than the bismuth/lead ratio in the center section inside the grain which is relatively far from the grain boundary.
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