发明申请
US20140369884A1 AG ALLOY FILM TO BE USED AS REFLECTING FILM AND/OR TRANSMITTING FILM OR AS ELECTRICAL WIRING AND/OR ELECTRODE, AG ALLOY SPUTTERING TARGET, AND AG ALLOY FILLER
审中-公开
用作反射膜和/或透射膜或电气接线和/或电极的AG合金膜,AG合金溅射靶和AG合金填料
- 专利标题: AG ALLOY FILM TO BE USED AS REFLECTING FILM AND/OR TRANSMITTING FILM OR AS ELECTRICAL WIRING AND/OR ELECTRODE, AG ALLOY SPUTTERING TARGET, AND AG ALLOY FILLER
- 专利标题(中): 用作反射膜和/或透射膜或电气接线和/或电极的AG合金膜,AG合金溅射靶和AG合金填料
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申请号: US14370153申请日: 2013-01-22
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公开(公告)号: US20140369884A1公开(公告)日: 2014-12-18
- 发明人: Yuki Tauchi , Yoko Shida , Hiroyuki Okuno
- 申请人: KABUSHIKI KAISHA KOBE SEIKO SHO (Kobe Steel, Ltd.)
- 申请人地址: JP Kobe-shi
- 专利权人: KABUSHIKI KAISHA KOBE SEIKO SHO (Kobe Steel, Ltd.)
- 当前专利权人: KABUSHIKI KAISHA KOBE SEIKO SHO (Kobe Steel, Ltd.)
- 当前专利权人地址: JP Kobe-shi
- 优先权: JP2012-021158 20120202; JP2012-171487 20120801
- 国际申请: PCT/JP2013/051152 WO 20130122
- 主分类号: C22C5/06
- IPC分类号: C22C5/06 ; G02B5/26 ; H01B1/02 ; C23C14/34 ; C23C14/16
摘要:
The present invention provides an Ag alloy film which exhibits a low-level electrical resistivity nearly equivalent to that of a pure Ag film and which is superior to a conventional Ag alloy film in durability (specifically, resistances to salt water and halogen) and in the adhesion to a substrate. Further, the deposition rate of this Ag alloy film by sputtering is as high as that of a pure Ag film. Provided is an Ag alloy film useful as a reflecting film and/or a transmitting film or as an electrical wiring and/or an electrode, including 0.1 to 1.5 atomic % of at least one element selected from Pd, Au and Pt, and 0.02 to 1.5 atomic % of at least one element selected from at least one rare earth element, Bi and Zn with the balance being Ag and inevitable impurities.
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