Invention Application
- Patent Title: INORGANIC OXIDE THIN FILM AND METHOD FOR PREPARING THE SAME
- Patent Title (中): 无机氧化物薄膜及其制备方法
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Application No.: US14029158Application Date: 2013-09-17
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Publication No.: US20140339511A1Publication Date: 2014-11-20
- Inventor: Dong Chan KIM , Seok Gyu YOON , Kyu Hwan HWANG , Eung Do KIM , Bo Ra JUNG , Dong Kyu SEO , Won Jong KIM , Young Woo SONG , Jong Hyuk LEE
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-City
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-City
- Priority: KR10-2013-0055085 20130515
- Main IPC: H01L27/32
- IPC: H01L27/32
Abstract:
A quantum-dots containing multi-component inorganic oxide thin film is provided to include an amorphous inorganic oxide bulk region and a plurality of crystalline inorganic oxide regions, wherein the crystalline inorganic oxide regions are discontinuously formed to be surrounded by the amorphous inorganic oxide of the bulk region.
Public/Granted literature
- US09070903B2 Inorganic oxide thin film and method for preparing the same Public/Granted day:2015-06-30
Information query
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