Invention Application
- Patent Title: DONOR SUBSTRATE AND METHOD OF FORMING TRANSFER PATTERN USING THE SAME
- Patent Title (中): 基底和使用其的形成转印图案的方法
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Application No.: US14098624Application Date: 2013-12-06
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Publication No.: US20140295587A1Publication Date: 2014-10-02
- Inventor: Joon Gu LEE , Ji Young CHOUNG , Jin Baek CHOI , Hyunsung BANG , Yeon Hwa LEE , Won Jong KIM , Young-Woo SONG
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-City
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin-City
- Priority: KR10-2013-0034658 20130329
- Main IPC: H01L51/56
- IPC: H01L51/56 ; B41M5/42
Abstract:
A donor substrate includes a base substrate; a light reflection layer disposed on the base substrate and overlapped with a portion of the base substrate, a heat blocking pattern disposed on the light reflection layer, overlapped with the light reflection layer, and including a plurality of air holes; a light-to-heat conversion layer disposed on the base substrate; and a transfer layer disposed on the light-to-heat conversion layer.
Public/Granted literature
- US09099687B2 Donor substrate and method of forming transfer pattern using the same Public/Granted day:2015-08-04
Information query
IPC分类:
