发明申请
- 专利标题: ULTRAVIOLET SENSOR AND METHOD FOR MANUFACTURING THE SAME
- 专利标题(中): ULTRAVIOLET传感器及其制造方法
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申请号: US14157768申请日: 2014-01-17
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公开(公告)号: US20140134782A1公开(公告)日: 2014-05-15
- 发明人: Kazutaka Nakamura
- 申请人: MURATA MANUFACTURING CO., LTD.
- 申请人地址: JP Nagaokakyo-Shi
- 专利权人: MURATA MANUFACTURING CO., LTD.
- 当前专利权人: MURATA MANUFACTURING CO., LTD.
- 当前专利权人地址: JP Nagaokakyo-Shi
- 优先权: JP2010-184671 20100820; JPPCT/JP2011/067959 20110805
- 主分类号: H01L31/18
- IPC分类号: H01L31/18 ; H01L31/032
摘要:
An ultraviolet sensor that includes a p-type semiconductor layer principally composed of (Ni, Zn)O, an n-type semiconductor layer composed of ZnO which is joined to the p-type semiconductor layer, an internal electrode embedded in the p-type semiconductor layer, and first and second terminal electrodes formed at both ends of the p-type semiconductor layer. The surface roughness of the p-type semiconductor layer is 1.5 μm or less, and preferably 0.3 μm or more and 1.0 μm or less. In a manufacturing process, the formed product prior to firing and/or the p-type semiconductor layer after firing is polished by barrel polishing so that the surface roughness Ra thereof is 1.0 μm or less. Thereby, light absorption efficiency can be improved to directly detect a desired large photocurrent and secure high reliability, and a spectral property can be controlled to strongly respond to various wavelength bands of ultraviolet light.
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