- 专利标题: Systems and Methods for Depositing and Charging Solar Cell Layers
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申请号: US13954099申请日: 2013-07-30
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公开(公告)号: US20140057386A1公开(公告)日: 2014-02-27
- 发明人: Jeong-Mo Hwang
- 申请人: Amtech Systems, Inc.
- 申请人地址: US AZ Tempe
- 专利权人: Amtech Systems, Inc.
- 当前专利权人: Amtech Systems, Inc.
- 当前专利权人地址: US AZ Tempe
- 主分类号: H01L31/18
- IPC分类号: H01L31/18
摘要:
Systems and methods of the present invention may be used to charge a layer (such as a passivation layer and/or antireflective layer) of a solar cell (e.g., wafer) with a positive or negative charge. The layer may retain the charge to improve operation of the solar cell. The charged layer may include any suitable dielectric material capable of retaining either a negative or a positive charge. Systems and methods of the present invention permit in-situ charging of a layer. Charging of a layer may be accomplished during or after deposition of the layer including after completing the whole solar cell process, in other words, on a finished cell.
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