发明申请
US20130337649A1 COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
有权
用于形成有机膜的化合物和使用其的有机膜组合物，用于形成有机膜的方法和方法
- 专利标题： COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
- 专利标题（中）： 用于形成有机膜的化合物和使用其的有机膜组合物，用于形成有机膜的方法和方法
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申请号： US13916071申请日： 2013-06-12
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公开(公告)号： US20130337649A1公开(公告)日： 2013-12-19
- 发明人: Seiichiro TACHIBANA , Daisuke KORI , Tsutomu OGIHARA , Takeru WATANABE , Kazumi NODA , Toshiharu YANO
- 申请人： Shin-Etsu Chemical Co., Ltd.
- 优先权： JP2012-137073 20120618
- 主分类号： G03F7/09
- IPC分类号： G03F7/09 ; H01L21/308
摘要：
The invention provides a compound for forming an organic film having a partial structure represented by the following formula (i) or (ii), wherein the ring structures Ar1, Ar2 and Ar3 each represent a substituted or unsubstituted benzene ring or naphthalene ring; e is 0 or 1; R0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; L0 represents a linear, branched or cyclic divalent organic group having 1 to 32 carbon atoms; and the methylene group constituting L0 may be substituted by an oxygen atom or a carbonyl group. There can be provided an organic film composition for forming an organic film having high dry etching resistance as well as advanced filling/planarizing characteristics.
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