发明申请
US20130234315A1 STRUCTURES AND METHODS FOR DETECTING SOLDER WETTING OF PEDESTAL SIDEWALLS
有权
用于检测PEDESTAL SIDEWALLS焊膏浸渍的结构和方法
- 专利标题: STRUCTURES AND METHODS FOR DETECTING SOLDER WETTING OF PEDESTAL SIDEWALLS
- 专利标题(中): 用于检测PEDESTAL SIDEWALLS焊膏浸渍的结构和方法
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申请号: US13414877申请日: 2012-03-08
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公开(公告)号: US20130234315A1公开(公告)日: 2013-09-12
- 发明人: Timothy H. Daubenspeck , Jeffrey P. Gambino , Christopher D. Muzzy , Wolfgang Sauter , Timothy D. Sullivan
- 申请人: Timothy H. Daubenspeck , Jeffrey P. Gambino , Christopher D. Muzzy , Wolfgang Sauter , Timothy D. Sullivan
- 申请人地址: US NY Armonk
- 专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人: INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址: US NY Armonk
- 主分类号: H01L23/498
- IPC分类号: H01L23/498 ; H01L21/768
摘要:
Structures and methods for detecting solder wetting of pedestal sidewalls. The structure includes a semiconductor wafer having an array of integrated circuit chips, each of the integrated circuit chips having an array of chip pedestals having respective chip solder columns on top of the chip pedestals, the pedestals spaced apart a first distance in a first direction and a spaced apart second distance in second direction perpendicular to the first direction; and at least one monitor structure disposed in different regions of the wafer from the integrated circuit chips, the monitor structure comprising at least a first pedestal and a first solder column on a top surface of the first pedestal and a second pedestal and a second solder column on a top surface of the second pedestal, the first and the second pedestals spaced apart a third distance, the third distance less than the first and the second distances.
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