Invention Application
- Patent Title: BEAM LINE DESIGN TO REDUCE ENERGY CONTAMINATION
- Patent Title (中): 光束线设计,以减少能源污染
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Application No.: US13348855Application Date: 2012-01-12
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Publication No.: US20130181139A1Publication Date: 2013-07-18
- Inventor: Edward C. EISNER , Bo H. VANDERBERG
- Applicant: Edward C. EISNER , Bo H. VANDERBERG
- Applicant Address: US MA Beverly
- Assignee: Axcelis Technologies, Inc.
- Current Assignee: Axcelis Technologies, Inc.
- Current Assignee Address: US MA Beverly
- Main IPC: G21K5/04
- IPC: G21K5/04 ; G21K5/00 ; G21K1/10

Abstract:
Methods and apparatus for reducing energy contamination can be provided to a beam line assembly for ion implantation. Protrusions comprising surface areas and grooves therebetween can face neutral trajectories within a line of sight view from the workpiece within the beam line assembly. The protrusions can alter the course of the neutral trajectories away from the workpiece or cause alternate trajectories for further impacting before hitting a workpiece, and thereby, further reduce energy contamination for more sensitive implants.
Public/Granted literature
- US08963107B2 Beam line design to reduce energy contamination Public/Granted day:2015-02-24
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