Invention Application
- Patent Title: Fe-Pt-Based Ferromagnetic Material Sputtering Target
- Patent Title (中): 基于Fe-Pt的铁磁材料溅射靶
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Application No.: US13816043Application Date: 2011-08-05
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Publication No.: US20130168240A1Publication Date: 2013-07-04
- Inventor: Shin-ichi Ogino , Yuichiro Nakamura
- Applicant: Shin-ichi Ogino , Yuichiro Nakamura
- Applicant Address: JP Tokyo
- Assignee: JX NIPPON MINING & METALS CORPORATION
- Current Assignee: JX NIPPON MINING & METALS CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2010-195143 20100831
- International Application: PCT/JP2011/067936 WO 20110805
- Main IPC: C23C14/34
- IPC: C23C14/34

Abstract:
An Fe—Pt-based ferromagnetic material sputtering target comprising a metal and a metal oxide, wherein the metal has a composition in which Pt is contained in an amount of 5 mol % or more and 60 mol % or less and the remainder is Fe. An object of the present invention is to provide a ferromagnetic material sputtering target, which enables to form a magnetic recording layer composed of a magnetic phase such as an Fe—Pt alloy, and a non-magnetic phase to isolate the magnetic phase, and in which a metal oxide is used as one of the materials for the non-magnetic phase. Provided is a ferromagnetic material sputtering target wherein an inadvertent release of the metal oxide during sputtering and particle generation due to abnormal electrical discharge starting at a void inherently included in the target are suppressed, the adherence between the metal oxide and the matrix alloy is enhanced, and its density is increased.
Public/Granted literature
- US09328412B2 Fe—Pt-based ferromagnetic material sputtering target Public/Granted day:2016-05-03
Information query
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