发明申请
- 专利标题: METHOD FOR MAKING LIGHT EMITTING DIODE
- 专利标题(中): 制造发光二极管的方法
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申请号: US13479229申请日: 2012-05-23
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公开(公告)号: US20130143340A1公开(公告)日: 2013-06-06
- 发明人: ZHEN-DONG ZHU , QUN-QING LI , LI-HUI ZHANG , MO CHEN , SHOU-SHAN FAN
- 申请人: ZHEN-DONG ZHU , QUN-QING LI , LI-HUI ZHANG , MO CHEN , SHOU-SHAN FAN
- 申请人地址: TW Tu-Cheng CN Beijing
- 专利权人: HON HAI PRECISION INDUSTRY CO., LTD.,TSINGHUA UNIVERSITY
- 当前专利权人: HON HAI PRECISION INDUSTRY CO., LTD.,TSINGHUA UNIVERSITY
- 当前专利权人地址: TW Tu-Cheng CN Beijing
- 优先权: CN201110395469.6 20111203
- 主分类号: H01L33/06
- IPC分类号: H01L33/06 ; B82Y40/00
摘要:
A method for making light emitting diode includes following steps. A substrate is provided. A first semiconductor layer is grown on a surface of the substrate. A patterned mask layer is located on a surface of the first semiconductor layer, and the patterned mask layer includes a number of bar-shaped protruding structures, a slot is defined between each two adjacent protruding structures to expose a portion of the first semiconductor layer. The exposed first semiconductor layer is etched to form a protruding pair. A number of three-dimensional nano-structures are formed by removing the patterned mask layer. An active layer and a second semiconductor layers are grown on the number of three-dimensional nano-structures in that order. A first electrode is electrically connected with the first semiconductor layer. A second electrode is located to cover the entire surface of the second semiconductor layer which is away from the active layer.
公开/授权文献
- US08778709B2 Method for making light emitting diode 公开/授权日:2014-07-15
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