发明申请
US20130139966A1 JIG FOR USE IN ETCHING AND CHEMICAL LIFT-OFF APPARATUS INCLUDING THE SAME
审中-公开
JIG用于蚀刻和化学提升装置，包括它们
- 专利标题： JIG FOR USE IN ETCHING AND CHEMICAL LIFT-OFF APPARATUS INCLUDING THE SAME
- 专利标题（中）： JIG用于蚀刻和化学提升装置，包括它们
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申请号： US13619521申请日： 2012-09-14
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公开(公告)号： US20130139966A1公开(公告)日： 2013-06-06
- 发明人: Su-hee CHAE , Jun-youn KIM , Young-soo PARK , Jae-won LEE , Young-jo TAK , Hyun-gi HONG
- 申请人： Su-hee CHAE , Jun-youn KIM , Young-soo PARK , Jae-won LEE , Young-jo TAK , Hyun-gi HONG
- 申请人地址： KR Suwon-Si
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR Suwon-Si
- 优先权： KR10-2011-0127862 20111201
- 主分类号： H01L21/306
- IPC分类号： H01L21/306
摘要：
A jig for use in etching supports an etching target while an etching process is performed and surrounds a remaining region of the etching target except for a portion of the etching target, so as to expose the portion of the etching target. Accordingly, a stable support of the etching target during the etching process may be provided, and thus an etching of an undesired region may be prevented, and a stable production yield may be accomplished.
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