Invention Application
US20130049010A1 HIGH DENSITY GALLIUM NITRIDE DEVICES USING ISLAND TOPOLOGY 有权
高密度GALLIUM NITRIDE设备使用岛屿拓扑学

HIGH DENSITY GALLIUM NITRIDE DEVICES USING ISLAND TOPOLOGY
Abstract:
A Gallium Nitride (GaN) series of devices—transistors and diodes are disclosed—that have greatly superior current handling ability per unit area than previously described GaN devices. The improvement is due to improved layout topology. The devices also include a simpler and superior flip chip connection scheme and a means to reduce the thermal resistance. A simplified fabrication process is disclosed and the layout scheme which uses island electrodes rather than finger electrodes is shown to increase the active area density by two to five times that of conventional inter-digitated structures. Ultra low on resistance transistors and very low loss diodes can be built using the island topology. Specifically, the present disclosure provides a means to enhance cost/effective performance of all lateral GaN structures.
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