发明申请
- 专利标题： APPARATUS AND METHOD FOR TREATING SUBSTRATE
- 专利标题（中）： 用于处理基板的装置和方法
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申请号： US13537914申请日： 2012-06-29
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公开(公告)号： US20130000140A1公开(公告)日： 2013-01-03
- 发明人: Eunsun Jung , Woo Young Kim , Chan Young Heo , Jeong Seon Park
- 申请人： Eunsun Jung , Woo Young Kim , Chan Young Heo , Jeong Seon Park
- 申请人地址： KR Cheonan-si
- 专利权人： SEMES CO., LTD.
- 当前专利权人： SEMES CO., LTD.
- 当前专利权人地址： KR Cheonan-si
- 优先权： KR10-2011-0064987 20110630; KR10-2011-0104768 20111013
- 主分类号： F26B5/00
- IPC分类号： F26B5/00
摘要：
Provided are an apparatus and method for treating a substrate, and more particularly, to an apparatus and method for treating a substrate using a supercritical fluid. The apparatus for treating a substrate includes a process chamber in which an organic solvent remaining on a substrate is dissolved using a fluid provided as a supercritical fluid to dry the substrate and a recycling unit in which the organic solvent is separated from the fluid discharged from the process chamber to recycle the fluid.
公开/授权文献
- US09679788B2 Apparatus and method for treating substrate 公开/授权日：2017-06-13
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